NCL – Nano-Characterization Lab

The Nano-Characterization Lab facility offers state-of-the-art services for the characterization of nanomaterials and nanostructures developed at ICFO, within the various groups as well as in the nanofabrication facility (NFL). NCL’s unique equipment facilities provides multiple characterization techniques for imaging optoelectronic materials, nanophotonic structures and devices thereof on multiple length-scales using photons, electrons, mechanical forces as well as x-rays as probes.

Facility

Images

Electron Microscopy

The facility offers a state-of-art electron microscopy suite with currently 2 SEMs one offering Ultra-high resolution at high and low beam energies for surface sensitive samples.

X-ray diffraction Facility

NCL also has An X-ray diffraction facility for powder and thin film measurements, featuring also X-ray reflection for thin film measurements.

Spectroscopic Ellipsometry

NCL’s spectroscopic ellipsometry covering a very broad spectral range from 300 nm – 20 μm, provides unprecedented information on the optical properties of materials and photonic structures at such a broad range.

Scanning Probe Microscopy

NCL provides several state-of-art scanning probe microscopy systems offering several techniques including AFM, (photo-)conductive AFM, Kelvin-probe AFM, scanning-CAP AFM etc.

Institutional Contacts / Head of Facilities

Provisional Contacts

Prof. Dr. Gerasimos Konstantatos | NCL Chair |  gerasimos.konstantatos@icfo.eu  | +34 935534182 |  ORCID 

Operations Manager

Dr. Johann Osmond |  johann.osmond@icfo.eu  | +34 935534030 |  ORCID 

NCL Chair

Prof. Dr. Gerasimos Konstantatos |  gerasimos.konstantatos@icfo.eu  | +34 935534182 |  ORCID 

Dr. Pablo Loza-Alvarez | Facilities Coordinator |  pablo.loza@icfo.eu  | 93 553 4068 - 93 554 2259 |  ORCID 

CERCA Institutes

Owners

Centres CERCA List

Equipments & Services Offered

Available techniques Electron Microscopy: The facility offers a state-of-art electron microscopy suite with currently 2 SEMs one offering Ultra-high resolution at high and low beam energies for surface sensitive samples. X-ray diffraction Facility: NCL also has An X-ray diffraction facility for powder and thin film measurements, featuring also X-ray reflection for thin film measurements. Spectroscopic Ellipsometry: NCL’s spectroscopic ellipsometry covering a very broad spectral range from 300 nm – 20 μm, provides unprecedented information on the optical properties of materials and photonic structures at such a broad range. Scanning Probe Microscopy: NCL provides several state-of-art scanning probe microscopy systems offering several techniques including AFM, (photo-)conductive AFM, Kelvin-probe AFM, scanning-CAP AFM etc.

Categorització

RIS3CAT domains & other

RIS3CAT Domains
CERCA GINYS Categories

GINYS-ICFO-005

Access procedure & Fares

Open. In order to request access, detailed information on the available equipments and fees, please contact: gerasimos.konstantatos@icfo.eu; johann.osmond@icfo.eu