MicrofabSpace

Microfabrication: 3D DLP Reify printer, Solus (broadband technology from 350nm to 750nm approximately) 3D DLP Microlay printer, Versus 385 (385nm LED technology) Süss UV photolithography mask aligner, MJB4 (broadband technology from 260nm to 460nm approximately) Kloé UV photolithography mask aligner, KUB3 (365nm LED technology) Heidelberg Direct Writting Laser Lithography system, DWL66 (410nm laser technology) Reith electron lithography system, Elphy Plus VII Quimipol Chemical BathsEvaporator and Sputtering Leybold, Univex 450B Harrick Oxygen Plasma Generator, PDC-002-CE Spin Coaters Laurel, WS400A-6TFM and WS-650Sz PSelecta oven, Conterm 19L Heating plates PSelecta, Plactronic Customized puncher Characterization: Dataphysics contact angle, OCA 15Pro Veeco interferometer, Wyko NT1100 Olympus optical microscope, X51RF Bruker Profilometer, DektakXT Olympus stereo microscope, SZX10 Nikon optical microscope, Eclipse L150 Additional characterization services are available at the Microscopy Characterization facility.

Access to 10,000 class clean room, specialized in the Microfabrication and characterization of biomedical devices. Training in Microfabrication and Characterization techniques, equipment, and processes for autonomous use (self-user mode). Customized Microfabrication and Characterization Services, led by scientific staff (order mode with previous quotation). Microfabrication: Custom design and fabrication of microfluidic masters, and other applications, based optical lithography with SU-8 (Down to 1μm lateral resolution) Custom design and fabrication of microfluidic masters, and other applications, based on 3D printing (Down to 100μm lateral resolution) Design and fabrication of microelectrodes, and other microelectronics’ structuresDesign and fabrication of high-resolution nanostructures, by electron beam lithography (Down to 100nm lateral resolution) Fabrication of microfluidic chips based on PDMS Design and fabrication of Cr photomasks for photolithographic processes (Down to 1μm lateral resolution) Characterization: Surface topographic analysis using optical interferometry and mechanical profilometry Optical characterization of samples by bright and dark field optical microscopy Measurements of the contact angle for the wettability properties of the surface Morphological characterization by electron microscopy SEM

GINYS-IBEC-001

Open. Conditions